Loading…

Toshiba Materials will open a second production facility for silicon nitride substrates in Oita, Japan, with a 10 billion yen (approx. US$91 million) investment program running until March 2023. Production is expected to start in July 2021, with initial capacity of about 40,000 m2/year.
“Production at the new plant is expected to start in July 2021.”bisinfotech.com
Summarized from public sources; check the original articles before acting on it.