JX Nippon Mining & Metals invests ¥23B to expand sputtering target production

JX Nippon Mining & Metals decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times fiscal 2023 levels, with sequential operation planned from the second half of fiscal 2027.

“JX Nippon Mining & Metals has decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times that of fiscal 2023.”japanir.jp

• 1 source
• japanir.jpJX Nippon Mining & Metals Invests Approximately JPY 23 Billion to Expand Semiconductor Sputtering Target Production at Hitachinaka New Plant | Japan IRMar 10, 2026

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