# NSIG subsidiary to invest CNY3.457B in silicon materials R&D project in Shanghai

Shanghai NSIG subsidiary Shanghai Xinsheng Semiconductor Technology plans to invest about CNY3.457 billion to build an integrated circuit silicon materials engineering R&D support project in Shanghai's Lingang new area.

- Type: Investment
- Announced: 2022-01-28
- Where: Shanghai Lingang new area, China
- Value: $543.0M (3.46B CNY)
- Status: announced
- Products: silicon materials for integrated circuits
- Sectors: [Semiconductors and Industrial Electronics](https://endata.com/sectors/semiconductors-electronics.md)

## Companies

- [Shanghai NSIG](https://endata.com/companies/60661.md)
- [Shanghai Xinsheng Semiconductor Technology](https://endata.com/companies/60662.md)

## Sources

- [beta.zhitongcaijing.com](http://beta.zhitongcaijing.com/content/detail/651686.html), 2022-01-28: "沪硅产业(688126.SH)发布公告，该公司子公司上海新昇半导体科技有限公司拟在中国(上海)自由贸易试验区临港新片区建设“集成电路硅材料工程研发配套”项目。本项目计划总投资约为34.57亿元。"

---
Data from Endata (https://endata.com/). Announcements are summarized from public sources and may be incomplete; check the linked originals.