# JX Nippon Metals & Mining to build two factories in Hitachi, Japan

JX Nippon Metals & Mining Corporation decided to increase production capacity for sputtering targets for semiconductors and treated rolled copper foil by establishing two new factories in Hitachi, Ibaraki Prefecture, Japan. The total investment for the two factories is around 30.0 billion yen, with overall investment including other sites reaching 48.0 billion yen.

- Type: Expansion
- Announced: 2021-12-08
- Where: Hitachi, Ibaraki Prefecture, Japan
- Value: $264.0M (30.0B JPY)
- Status: announced
- Capacity: 80% increase in sputtering target capacity vs FY2020
- Products: sputtering targets for semiconductors, treated rolled copper foil
- Sectors: [Semiconductors and Industrial Electronics](https://endata.com/sectors/semiconductors-electronics.md)

## Companies

- [JX Nippon Metals & Mining](https://endata.com/companies/59530.md)

## Sources

- [jx-nmm.com](https://www.jx-nmm.com/english/newsrelease/fy2021/20211208_02.html), 2021-12-08: "The Company has decided to increase its capacity to produce sputtering targets for semiconductors and treated rolled copper foil, demand for which is expected to grow."

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Data from Endata (https://endata.com/). Announcements are summarized from public sources and may be incomplete; check the linked originals.