# Sumitomo Chemical to expand photoresist production capacity in Osaka

Sumitomo Chemical will expand production capacity for photoresists for advanced semiconductor processes, including ArF immersion and EUV lithography, by installing new production lines at its Osaka Works. The new lines are due to commence operation in the first half of fiscal 2022.

- Type: Expansion
- Announced: 2021-02-08
- Where: Osaka, Japan, Japan
- Starts operating: Q2 2022
- Status: announced
- Products: photoresists for ArF immersion, photoresists for EUV lithography
- Sectors: [Semiconductors and Industrial Electronics](https://endata.com/sectors/semiconductors-electronics.md), [Specialty Chemicals](https://endata.com/sectors/specialty-chemicals.md)

## Companies

- [Sumitomo Chemical](https://endata.com/companies/20503.md)

## Sources

- [sumitomo-chem.co.jp](https://www.sumitomo-chem.co.jp/english/news/detail/20210208e.html), 2021-02-08: "Sumitomo Chemical has decided to expand production capacity for photoresists for advanced semiconductor processes, including ArF (argon fluoride) immersion and EUV (extreme ultraviolet) lithography, by installing new production lines in its Osaka Works."

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Data from Endata (https://endata.com/). Announcements are summarized from public sources and may be incomplete; check the linked originals.