# Toshiba Materials to open second silicon nitride substrate plant in Oita

Toshiba Materials will open a second production facility for silicon nitride substrates in Oita, Japan, with a 10 billion yen (approx. US$91 million) investment program running until March 2023. Production is expected to start in July 2021, with initial capacity of about 40,000 m2/year.

- Type: Expansion
- Announced: 2020-01-27
- Where: Oita, Oita Prefecture, Japan
- Value: $91.0M (10.0B JPY)
- Starts operating: Jul 2021
- Status: announced
- Capacity: 40,000 m2/year
- Products: silicon nitride substrates
- Sectors: [Semiconductors and Industrial Electronics](https://endata.com/sectors/semiconductors-electronics.md)

## Companies

- [Toshiba Materials](https://endata.com/companies/9488.md)

## Sources

- [bisinfotech.com](https://www.bisinfotech.com/toshiba-materials-to-open-second-production-site-in-oita/), 2020-01-27: "Production at the new plant is expected to start in July 2021."

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Data from Endata (https://endata.com/). Announcements are summarized from public sources and may be incomplete; check the linked originals.