# Toshiba starts construction of Fab 6 and Memory R&D Center at Yokkaichi

Toshiba Corporation started construction of a new semiconductor fabrication facility, Fab 6, and a Memory R&D Center at Yokkaichi Operations in Mie prefecture, Japan. Fab 6 will be dedicated to BiCS FLASH 3D Flash memory production, with Phase 1 completion scheduled for summer 2018.

- Type: New facility
- Announced: 2017-02-01
- Where: Yokkaichi, Mie prefecture, Japan
- Starts operating: Q3 2018
- Status: under construction
- Products: BiCS FLASH 3D Flash memory
- Sectors: [Semiconductors and Industrial Electronics](https://endata.com/sectors/semiconductors-electronics.md)

## Companies

- [Toshiba](https://endata.com/companies/8893.md)

## Sources

- [global.toshiba](https://www.global.toshiba/ww/news/corporate/2017/02/pr0901.html), 2017-02-01: "Toshiba is determined to enhance its competitiveness in the memory business by timely expansion of BiCS FLASH production in line with market trends."

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Data from Endata (https://endata.com/). Announcements are summarized from public sources and may be incomplete; check the linked originals.