# JX Metals invests ¥23B to expand sputtering target production in Hitachinaka

JX Metals will invest approximately ¥23 billion to expand production capacity of sputtering targets for AI semiconductors at its new Hitachinaka plant in Ibaraki Prefecture, Japan, increasing capacity 1.6 times vs FY2023, with operations starting in H2 FY2027.

- Type: Expansion
- Announced: 2026-06-03
- Where: Hitachinaka, Ibaraki Prefecture, Japan
- Value: $160.0M (23.0B JPY)
- Starts operating: Q4 2027
- Status: announced
- Capacity: 1.6 times FY2023 level
- Products: sputtering targets for AI semiconductors
- Sectors: [Semiconductors and Industrial Electronics](https://endata.com/sectors/semiconductors-electronics.md)

## Companies

- [JX Metals](https://endata.com/companies/56975.md)

## Sources

- [automation-news.jp](https://www.automation-news.jp/2026/06/104501/), 2026-06-03: "JX金属は、AIデータセンター向けを中心に需要が急増している半導体用スパッタリングターゲットの生産能力を強化するため、茨城県ひたちなか市の「ひたちなか新工場」内に約230億円の増産投資を実施する。"

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Data from Endata (https://endata.com/). Announcements are summarized from public sources and may be incomplete; check the linked originals.