# JX Nippon Mining & Metals invests ¥23B to expand sputtering target production

JX Nippon Mining & Metals decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times fiscal 2023 levels, with sequential operation planned from the second half of fiscal 2027.

- Type: Expansion
- Announced: 2026-03-10
- Where: Hitachinaka City, Ibaraki Prefecture, Japan
- Value: $145.8M (23.0B JPY)
- Starts operating: Q4 2027
- Status: announced
- Capacity: 1.6 times fiscal 2023 capacity
- Products: semiconductor sputtering targets
- Sectors: [Semiconductors and Industrial Electronics](https://endata.com/sectors/semiconductors-electronics.md)

## Companies

- [JX Nippon Mining & Metals Corporation](https://endata.com/companies/38365.md)

## Sources

- [japanir.jp](https://japanir.jp/en/company/company-5016/ir/5016-20260310-01_wp_business_update/), 2026-03-10: "JX Nippon Mining & Metals has decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times that of fiscal 2023."

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Data from Endata (https://endata.com/). Announcements are summarized from public sources and may be incomplete; check the linked originals.